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US 2022/0285132 A1Published application
Substrate processing apparatus
AssigneeLinco Technology Co., Ltd.
InventorsYI-YUAN HUANG, YI-CHENG LIU
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Abstract
A substrate processing apparatus comprises a chamber member that defines an interior volume that has an aspect ratio. The chamber member comprises a pair of laterally opposing inlet walls and a loading port. Each of the pair of laterally opposing inlet walls has an inlet port configured to receive output from a remote plasma source. The loading port is arranged between the pair of inlet walls, configured to allow passage of a substrate into the interior volume.
Claims20
A substrate processing apparatus, comprising:
- a chamber member that defines an interior volume that has an aspect ratio, the chamber member comprising:
- a pair of laterally opposing inlet walls, each having an inlet port configured to receive output from a remote plasma source, and
- a loading port arranged laterally between the pair of inlet walls, configured to allow passage of a substrate into the interior volume.
A substrate processing apparatus, comprising:
- a chamber member that defines an interior volume that has an aspect ratio no greater than 1, the chamber member comprising:
- a pair of laterally opposing inlet walls, each having an inlet port, and
- a loading port arranged laterally between the pair of inlet walls, configured to allow passage of a vertically oriented substrate carrier having a retaining frame body into the interior volume;
- and
- a pair of remote plasma sources respectively arranged laterally over the inlet walls, each one of which being accessible through the inlet ports on the inlet walls.
2 more elements
Dependencies are inferred from the claim text.