Aberration correction in charged particle system
AssigneeASML Netherlands B.V.
InventorsAlexander Hendrik Vincent VAN VEEN, Willem Henk URBANUS, Marco Jan-Jaco WIELAND
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AssigneeASML Netherlands B.V.
InventorsAlexander Hendrik Vincent VAN VEEN, Willem Henk URBANUS, Marco Jan-Jaco WIELAND
Estimating the term…
A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking 5 part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.
1-27. (canceled)
A lens element of a charged particle system, comprising:
A charged particle system, comprising:
A cooling arrangement of a lens element, comprising:
Dependencies are inferred from the claim text.