Detecting an excursion of a cmp component using time-based sequence of images
AssigneeApplied Materials, Inc.
InventorsSidney P. Huey, Thomas Li, Benjamin Cherian
Life of this patent
Estimating the term…
Loading patent…
AssigneeApplied Materials, Inc.
InventorsSidney P. Huey, Thomas Li, Benjamin Cherian
Estimating the term…
Monitoring operations of a polishing system includes obtaining a time-based sequence of reference images of a component of the polishing system performing operations during a test operation of the polishing system, receiving from a camera a time-based sequence of monitoring images of an equivalent component of an equivalent polishing system performing operations during polishing of a substrate, determining a difference value for the time-based sequence of monitoring images by comparing the time-based sequence of reference images to the time-based sequence of monitoring image using an image processing algorithm, determining whether the difference value exceeds a threshold, and in response to determining the difference value exceeds the threshold, indicating an excursion.
A polishing system, comprising:
A computer program product, tangibly embodied in computer-readable media, comprising instructions to cause one or more computers to:
(canceled)
A method for monitoring operations of a polishing system, the method comprising:
Dependencies are inferred from the claim text.