Display device and method of manufacturing the display device

A method of manufacturing a display device, the method comprising:

• providing an inorganic layer on a carrier substrate;
• providing a first flexible substrate on the inorganic layer;
• providing a first barrier layer on the first flexible substrate;
• and
• providing a thin film transistor layer on the first barrier layer,
• wherein the inorganic layer comprises at least one material selected from silicon nitride, silicon oxide, and silicon oxynitride.

A method of manufacturing a display device to, the method comprising:

• providing a dipole-removing layer on a carrier substrate;
• providing a flexible substrate on the dipole-removing layer comprising an inorganic material;
• providing a barrier layer on the flexible substrate;
• and
• providing a thin film transistor layer on the barrier layer.