Novel silylcyclodisilazane compound and method for manufacturing silicon-containing thin film using the same

A composition for depositing a silicon-containing thin film containing a silylcyclodisilazane compound represented by the following Formula 2:

• wherein
• R11 to R17 are each independently hydrogen, C1-C7 alkyl, C3-C7 cycloalkyl or C2-C7 alkenyl;
• R18 is hydrogen, C1-C7 alkyl, C3-C7 cycloalkyl, C2-C7 alkenyl or —SiRaRbRc;
• and
• Ra, Rb and Rc are each independently hydrogen, C1-C7 alkyl, C3-C7 cycloalkyl or C2-C7 alkenyl;
• provided that when R11 to R14 are all C1-C7 alkyl, R18 is not —SiRaRbRc.

A method for manufacturing a silicon-containing thin film using a silylcyclodisilazane compound represented by the following Formula 2:

• wherein
• R11 to R17 are each independently hydrogen, C1-C7 alkyl, C3-C7 cycloalkyl or C2-C7 alkenyl;
• R18 is hydrogen, C1-C7 alkyl, C3-C7 cycloalkyl, C2-C7 alkenyl or —SiRaRbRc;
• and
• Ra, Rb and Rc are each independently hydrogen, C1-C7 alkyl, C3-C7 cycloalkyl or C2-C7 alkenyl;
• provided that when R11 to R14 are all C1-C7 alkyl, R18 is not —SiRaRbRc.