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US 2022/0250202 A1Published application
Random Walk Polishing Machine
OwnerBenjamin Grossmaninventor
Life of this patent
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Abstract
A polishing machine for fine polishing and abrading work configured to employ a random walk theory algorithm to generate the movement pattern of the polishing or abrading element.
Claims8
A machine for polishing a workpiece comprising:
- a supporting surface for securing and supporting the workpiece;
- a polishing surface for polishing the workpiece secured to the top of the supporting surface;
- a mounting arrangement for supporting said supporting surface and said polishing surface with said mounting arrangement configured in a generally cylindrical shape and comprising a base, a casing and an upper plate;
- a movement arrangement for moving said polishing surface with respect to said supporting surface and across said workpiece with said movement arrangement housed within the said casing of said mounting arrangement and comprising a first oscillatory motor secured to said casing;
- a first eccentric ball bearing disposed on top of the first oscillatory motor and further disposed below and in contact with a second oscillatory motor disposed above the first oscillatory motor;
- a second eccentric ball bearing disposed on top of the second oscillatory motor;
- with said mounting arrangement further configured such that the second eccentric ball bearing is in contact with the bottom of the supporting surface;
- a first power source to operate the first oscillatory motor and a second power source to the second oscillatory motor, whereby said polishing surface moves across said workpiece in a number of random polishing paths generated by the combined operation of the first oscillatory motor operating at a first frequency and the second oscillatory motor operating at a second frequency.
5 more elements
Dependencies are inferred from the claim text.