Water-resistant nanofilm, preparation method and article thereof
AssigneeJiangsu Favored Nanotechnology Co., Ltd.
InventorJian ZONG
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Abstract
The present disclosure provides a water-resistant nanofilm, a preparation method and an article thereof, in which fluorocarbon gas is used as a plasma source and is formed on a substrate surface of substrate by a plasma enhanced chemical vapor deposition method, so that the water-resistance performance of the substrate surface is improved.
Claims46
A water-resistant nanofilm, wherein the water-resistant nanofilm is formed on a surface of a substrate by plasma enhanced chemical vapor deposition through using fluorocarbon gas as plasma source.
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A method for preparing a water-resistant nanofilm, wherein the water-resistant nanofilm is formed of fluorocarbon gas as plasma source gas on a surface of a substrate by plasma enhanced chemical vapor deposition via a PECVD device.
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An article comprising a water-resistant nanofilm, wherein the article is prepared by exposing the article to plasma source which contains a structural formula CxF2x+2 or CxF2x, and forming the water-resistant nanofilm on at least a part of surfaces of the article from reaction materials by plasma enhanced chemical vapor deposition, wherein x is 1, 2 or 3.
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Dependencies are inferred from the claim text.