Process for producing trichlorosilane with structure-optimised silicon particles

Abstract

Chlorosilanes and methods of producing chlorosilanes. The process for producing chlorosilanes includes the step of selecting a chlorosilane having a general formulae (1) HnSiCl4-n and (2) HmCl6-mSi2 wherein n is 0 to 3 and m is from 0 to 4. The chlorosilane selected is then placed within a fluidized bed reactor. A hydrogen chloride-containing reaction gas is reacted with a particulate contact mass containing silicon at temperatures of 280° C. to 400° C. Where the operating granulation, understood as meaning the granulation or granulation mixture introduced into the fluidized bed reactor, contains at least 1% by mass of silicon-containing particles S described by a structural parameter S and wherein S has a value of at least 0 and is calculated as follows S = ( φ s - 0 . 7 ⁢ 0 ) · ρ S ⁢ D ρ F Wherein φS is symmetry-weighted sphericity factor, ρSD is poured density [g/cm3], and ρF is average particle solids density [g/cm3].

Dependencies are inferred from the claim text.