Closed-loop multiple-output radio frequency (rf) matching
AssigneeLam Research Corporation
InventorsEller Y. Juco, Karl Frederick Leeser
Life of this patent
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Abstract
An apparatus and method for performing closed-loop multiple-output control of radio frequency (RF) matching for a semiconductor wafer fabrication process is provided. An apparatus for providing signals to a station of a process chamber performs semiconductor fabrication processes. A plurality of signal generators generates signals having first and second frequencies. A measurement circuit measures a voltage standing wave ratio (VSWR). A match reflection optimizer has a reactive component configured to be adjusted responsive to an output signal from the measurement circuit.
Claims20
An apparatus for providing signals to a station of a process chamber configured to perform semiconductor fabrication processes, comprising:
- a plurality of signal generators configured to generate signals having first and second frequencies;
- a measurement circuit configured to measure a voltage standing wave ratio (VSWR);
- and
- a match reflection optimizer having a reactive component configured to be adjusted responsive to an output signal from the measurement circuit.
A method of coupling a plurality of signals from a corresponding number of signal generators to a plurality of stations of a process chamber, the method comprising:
- measuring a voltage standing wave ratio (VSWR) at an input port of a power divider;
- and
- responsive to the measured VSWR, adjusting a value of a reactive component of a match reflection optimizer, the adjustment of the reactive component to bring about a second VSWR lower than a first threshold value.
A fabrication chamber for processing semiconductor wafers, comprising:
- one or more signal generators configured to generate a corresponding number of RF signals to process stations of the fabrication chamber;
- a measurement circuit configured to measure the voltage standing wave ratios (VSWRs) of the RF signals;
- and
- a control module to control values of reactive components disposed between the one or more signal generators and the process stations of the fabrication chamber, the values of the reactive components configured to be adjusted so as to reduce each of the VSWRs of the RF signals to a value below a threshold VSWR value.
Dependencies are inferred from the claim text.