Imprint apparatus, imprint method, article manufacturing method, and storage medium
AssigneeCanon Kabushiki Kaisha
InventorKenji Yoshida
Life of this patent
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Abstract
An imprint apparatus capable of stably maintaining the concentration of gas supplied for imprint processing is provided even after the moving direction of a substrate is changed by comprising a gas supply port, and when the moving direction or the substrate is changed so that a next target shot region is to be imprinted, the substrate is moved to a position in the order of the next target shot region, the gas supply port, and the pattern region of a mold from the upstream in a predetermined direction, the substrate is then moved in the predetermined direction so that the next target shot region and the pattern region face each other while supplying the gas from the gas supply port, and then the next target shot region is imprinted by the pattern region.
Claims12
An imprint apparatus that performs imprint processing for forming a pattern by bringing a pattern region of a mold into contact with an imprint material on a substrate comprising:
- a substrate driving unit for moving the substrate;
- and
- a gas supply port provided at the periphery of the pattern region and for supplying gas to a space between the pattern region and the substrate,
- further comprising:
- at least one processor or circuit configured to function as:
- a control unit configured to perform control so that, in a case where the moving direction of the substrate by the substrate drive unit is changed so that a next target shot region is to be imprinted by the imprint processing, the substrate is moved to a position in the order of the next target shot region, the gas supply port, and the pattern region from the upstream in a predetermined direction, the substrate is then moved in the predetermined direction by the substrate driving unit so that the next target shot region and the pattern region face each other while supplying the gas from the gas supply port, and then the pattern region is brought into contact with the imprint material on the next target shot region of the substrate.
An imprint method for controlling an imprint apparatus that performs imprint processing for forming a pattern by bringing a pattern region of a mold into contact with an imprint material on a substrate,
- wherein the imprint apparatus includes a substrate drive unit for moving the substrate;
- and
- a gas supply port for supplying gas to a space between the pattern region and the substrate, which is provided at the periphery of the pattern region,
- the imprint method comprising:
- performing control so that, in a case where the moving direction of the substrate by the substrate drive unit is changed so that a next target shot region is to be imprinted by the imprint processing, the substrate is moved to a position in the order of the next target shot region, the gas supply port, and the pattern region from the upstream in a predetermined direction, the substrate is then moved in the predetermined direction by the substrate driving unit so that the next target shot region and the patient region face each other while supplying the gas from the gas supply port, and then the pattern region is brought into contact with the imprint material on the next target shot region of the substrate.
A non-transitory computer-readable storage medium configured to store a computer program to control an imprint apparatus configured to form a pattern by bringing a pattern region of a mold into contact with an imprint material on a substrate,
- wherein the imprint apparatus has a substrate driving unit for moving the substrate and a gas supply port for supplying gas to a space between the pattern region and the substrate, which is provided at the periphery of the pattern region, and
- wherein the computer program comprises instructions for executing following processes:
- performing control so that, in a case where the moving direction of the substrate by the substrate drive unit is changed so that a next target shot region is to be imprinted by the imprint processing, the substrate is moved to a position in the order of the next target shot region, the gas supply port, and the pattern region from the upstream in a predetermined direction, the substrate is then moved in the predetermined direction by the substrate driving unit so that the next target shot region and the pattern region face each other while supplying the gas from the gas supply port, and then the pattern region is brought into contact with the imprint material on the next target shot region of the substrate.
An article manufacturing method by using an imprint apparatus that performs imprint processing for forming a pattern by bringing a pattern region of a mold into contact with an imprint material on a substrate,
- the imprint apparatus comprising:
- a substrate driving mechanism for moving the substrate;
- a gas supply port provided at the periphery of the pattern region and for supplying gas to a space between the pattern region and the substrate;
- and
- a control unit configured to perform control so that, in a case where the moving direction of the substrate by the substrate drive unit is changed so that a next target shot region is to be imprinted by the imprint processing, the substrate is moved to a position in the order of the next target shot region, the gas supply port, and the pattern region from the upstream in a predetermined direction, the substrate is then moved in the predetermined direction by the substrate driving unit so that the next target shot region and the pattern region face each other while supplying the gas from the gas supply port, and then the pattern region is brought into contact with the imprint material on the next target shot region of the substrate,
- the article manufacturing method comprising:
- forming the pattern on the substrate by using the imprint apparatus;
- and
- developing the substrate on which the pattern is formed by the forming the pattern.
Dependencies are inferred from the claim text.