US 2022/0102119 A1Published application

Plasma processing apparatus

AssigneeTokyo Electron Limited

InventorsHwajun JUNG, Mitsunori OHATA, Yuki HOSAKA

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Abstract

A plasma processing apparatus comprising a processing chamber, a dielectric, an antenna, and a first to third electromagnet groups is disclosed. In the processing chamber, a mounting table having a mounting surface is included and a plasma process is performed. A surface of the dielectric faces the mounting surface. The antenna, provided on the opposite surface of the dielectric, introduces an electric field into the processing table through the dielectric to form plasma. The first electromagnet group, provided at a position higher than the mounting surface on an outer perimeter of the processing chamber, forms a first magnetic field above the mounting surface. The second electromagnet group, provided inside the mounting table along an outer perimeter thereof, and the third electromagnet group, provided at a position corresponding to the second electromagnet group on the outer perimeter of the processing chamber, cooperate with each other to form a second magnetic field around the mounting surface.

Claims15

Dependent claims

A plasma processing apparatus comprising:

a processing chamber including a mounting table having a mounting surface, wherein an object to be processed is mounted on the mounting surface and a plasma process is performed on the object to be processed in the processing chamber;
a dielectric which has a surface facing the mounting surface of the mounting table;
an antenna which is provided on a surface opposite to the facing surface of the dielectric and introduces an induced electric field into the processing table through the dielectric to form plasma;
a first electromagnet group which is provided at a position higher than the mounting surface of the mounting table on an outer perimeter of the processing chamber and forms a first magnetic field that traverses the processing chamber above the mounting surface of the mounting table;
a second electromagnet group provided inside the mounting table along an outer perimeter of the mounting table;
and
a third electromagnet group which is provided at a position corresponding to the second electromagnet group on the outer perimeter of the processing chamber and cooperates with the second electromagnet group to form a second magnetic field around the mounting surface of the mounting table.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application: 17/485,318Filed 24 Sep 2021
Priority: JP 2020-16137725 Sep 2020
Published: 31 Mar 2022
Term ends: Not estimatedThe source records don’t support an estimate.

Classification13 codes

H01J 37/32348
Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources: dielectric barrier discharge
H01J 37/32669
Magnetic control means: particular magnets or magnet arrangements for controlling the discharge
C23C 16/4585
The substrate being supported substantially horizontally: devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
C23C 16/4586
The substrate being supported substantially horizontally: elements in the interior of the support, e.g. electrodes, heating or cooling devices

Family

US 12,374,531 B2Related patent
US 2022/0102119 A1This patent

From the US filing history. Foreign family members aren’t listed.

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