Apparatus for processing substrate and method of determining whether substrate treatment process is normal
AssigneeSemes Co., Ltd.
InventorsOhyeol KWON, Soo Yeon SHIN, Hyun Hoo KIM, Myung Chan CHO
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Abstract
The inventive concept provides a method to determine whether a substrate treatment process is normal using a deep learning model. The method comprising receiving input on a substrate treatment process video, preprocessing the inputted video, using the deep learning model to study a preprocessed video, and determining whether the substrate treatment process is normal by comparing the trained model and a real time substrate treatment process video.
Claims20
A method for determining whether a substrate treatment process is normal using a deep learning model, the method comprising:
- receiving an input image of a substrate processing;
- preprocessing the input image;
- learning the preprocessed input image by using a deep learning model;
- and comparing a real time substrate treatment process image and a learned data by using the trained deep learning model to determine whether the substrate treatment process is normal.
A substrate treatment process apparatus for processing a substrate by spraying a chemical, the substrate treatment process apparatus comprising:
- an image capturing unit for capturing an image of the substrate and a chemical being sprayed on the substrate;
- and a determining unit for determining whether a substrate treatment process is normal by using a deep learning model.
A method for determining whether a wetting state of a substrate by using a deep learning model, the method comprising:
- receiving an input image of a substrate processing;
- preprocessing the input image;
- learning the preprocessed input image by using a deep learning model;
- and
- comparing a real time substrate treatment process image and the learned data by the deep learning model and determining whether a substrate treatment process is normal.
Dependencies are inferred from the claim text.