Semiconductor manufacturing apparatus, substrate transfer method, and program

A substrate transfer method of a semiconductor manufacturing apparatus including a plurality of process modules for performing desired processes on a plurality of substrates and a plurality of transfer modules for serially transferring the plurality of substrates to the plurality of process modules, the substrate transfer method comprising:

• calculating a cycle time so that a difference in time required for each of the desired processes is within an allowable time range and generating a transfer plan for the plurality of substrates based on the cycle time;
• and
• controlling the plurality of transfer modules so that the plurality of substrates are serially transferred to the process modules according to the generated transfer plan.

A program causing a semiconductor manufacturing apparatus including a plurality of process modules for performing desired processes on a plurality of substrates and a plurality of transfer modules for serially transferring the plurality of substrates to the plurality of process modules to:

• calculate a cycle time so that a difference in time required for each of the desired processes is within an allowable time range and generate a transfer plan for the plurality of substrates based on the cycle time;
• and
• control the plurality of transfer modules so that the plurality of substrates are serially transferred to the process modules according to the generated transfer plan.