Imprint apparatus and product manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsKenichi Kobayashi, Tatsuya Arakawa
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Abstract
An imprint apparatus executes imprint processing of curing imprint material in a state in which the imprint material supplied onto a substrate and a mold are in contact with each other. The imprint apparatus includes a modulator configured to modulate incident light, a first optical system configured to guide first light from a first light source to the modulator, and second light from a second light source that has a wavelength different from that of the first light to the modulator, and a second optical system configured to guide modulated light modulated by the modulator to the substrate.
Claims20
An imprint apparatus that executes imprint processing including,
- a contact process of bringing imprint material on a substrate and a mold in contact with each other,
- an alignment process of performing alignment of the substrate and the mold after the contact process, and
- a curing process of curing the imprint material after the alignment process,
- the imprint apparatus comprising:
- a first light source configured to generate first light that deforms the substrate for alignment of the substrate and the mold;
- a second light source configured to generate second light that partially cures the imprint material;
- and
- a modulator configured to generate first modulated light obtained by modulating the first light, and second modulated light obtained by modulating the second light,
- wherein either of the first modulated light and the second modulated light is selectively provided onto the substrate, and in the alignment process, switching between the first modulated light and the second modulated light is executed at least two times.
An imprint method of forming a pattern on an imprint material on a substrate using a mold, comprising:
- a contact process of bringing the imprint material and the mold in contact with each other,
- an alignment process of performing alignment of the substrate and the mold after the contact process, and
- a curing process of curing the imprint material after the alignment process,
- wherein, before a start of the alignment process or in parallel with the alignment process, a first operation to provide the first light that deforms the substrate for alignment of the substrate and the mold is performed, and
- wherein, after the first operation, a second operation to provide the second light onto the substrate, that partially cures the imprint material is performed in parallel with the alignment process, and after the second operation, a third operation to provide the first light onto the substrate is performed.
Dependencies are inferred from the claim text.