Method and System for Adjusting Edge Positions of a Drop Pattern
AssigneeCanon Kabushiki Kaisha
InventorsAmir Tavakkoli Kermani Ghariehali, Edward Brian Fletcher
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Abstract
A system and method of generating a drop pattern. The method may include receiving an initial drop pattern. The method may include receiving a target drop pattern exclusion edge for each of a plurality of locations. The method may include receiving one or more constraints of a dispensing system. The method may include generating a base drop pattern exclusion edge line based on the target drop pattern exclusion edge. The method may include generating a new drop pattern wherein drops deposited at an edge of the new drop pattern are positioned on integer multiples of the pitch constraint from the optimum base drop pattern exclusion edge line.
Claims15
A method of generating a drop pattern comprising:
- receiving an initial drop pattern;
- receiving a target drop pattern exclusion edge (DEE) for each of a plurality of locations;
- receiving one or more constraints of a dispensing system;
- generating a base drop pattern exclusion edge line based on the target drop pattern exclusion edge;
- and
- generating a new drop pattern wherein drops deposited at an edge of the new drop pattern are positioned on integer multiples of the pitch constraint from the optimum base drop pattern exclusion edge line.
A system comprising:
- a memory;
- and
- a processor configured to:
- receive an initial drop pattern;
- receive a target drop pattern exclusion edge for each of a plurality of locations;
- receive one or more constraints of a dispensing system;
- generate a base drop pattern exclusion edge line based on the target drop pattern exclusion edge;
- generate a new drop pattern wherein drops deposited at an edge of the new drop pattern are positioned on integer multiples of the pitch constraint from the optimum base drop pattern exclusion edge line.
Dependencies are inferred from the claim text.