Micromechanical structure and micromechanical sensor

A micromechanical sensor, comprising:

• a micromechanical structure, including:
• a substrate,
• a seismic mass movable with respect to the substrate,
• a detection structure, and
• a main spring, the seismic mass being connected to the substrate using the main spring,
• wherein a first direction and a second direction perpendicular to the first direction defining a main extension plane of the substrate,
• wherein the detection structure is configured to detect a deflection of the seismic mass, the detection structure including an electrode structure, the electrode structure including first electrodes mounted at the seismic mass and second electrodes mounted at the substrate, the first electrodes and the second electrodes having a two-dimensional extension in the first direction and in the second direction,
• wherein the micromechanical structure has a graduated stop structure including a first spring stop, a second spring stop, and a fixed stop, the stop structure being configured in such a way that initially the first spring stop comes into mechanical contact during a movement of at least one portion of the seismic mass in a third direction, which is perpendicular to the first direction and to the second direction, beyond an operating range, thereafter, the second spring stop comes into mechanical contact during a further movement of at least one portion of the seismic mass in the third direction, and, thereafter, the fixed stop comes into mechanical contact during a further movement of at least one portion of the seismic mass in the third direction.