Composition for film formation, resist composition, radiation-sensitive composition, method for producing amorphous film, resist pattern formation method, composition for underlayer film formation for lithography, method for producing underlayer film for lithography, and circuit pattern formation method

Abstract

A composition for film formation containing a polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the following formulae (1A) and (1B), wherein the repeating units are linked to each other by a direct bond between aromatic rings. (In the formula (1A), X represents an oxygen atom, a sulfur atom, a single bond, or non-crosslinked state and Y represents a 2n-valent group having 1 to 60 carbon atoms, or a single bond, wherein when X is non-crosslinked state, Y represents the 2n-valent group; in the formula (1B), A represents a benzene ring or a fused ring; in the formulas (1A) and (1B), each R0 is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, or a hydroxy group, wherein at least one R0 is a hydroxy group, and each m is independently an integer of 1 to 9; and N is an integer of 1 to 4, and each p is independently an integer of 0 to 3.)

Dependencies are inferred from the claim text.