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AssigneeLaser Systems & Solutions of Europe
InventorsFulvio MAZZAMUTO, Sylvain PERROT, Nabil DOURI, Guillaume Vincent THEBAULT, Karim Mikaël HUET, Guillermo Abraham GONZALEZ TRUJILLO
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A method for uniformly irradiating a frame of a processed substrate, the processed substrate including a plurality of frames, two consecutive frames being separated by an intermediate zone, the method includes steps of: determining an initial position of the processed substrate using a detecting unit; comparing the detected initial position with a first predetermined position associated with a first frame of the processed substrate; irradiating the first frame of the processed substrate by an irradiation beam emitted by a source unit and scanned by a scanning unit based on the first predetermined position, the irradiation beam being adapted to cover uniformly the whole first frame. A system for uniformly irradiating a frame of a processed substrate is also described.
A method for uniformly irradiating a frame of a processed substrate, said processed substrate comprising a plurality of frames, two consecutive frames being separated by an intermediate zone, said method comprises steps of:
A system for uniformly irradiating a frame of a processed substrate, said processed substrate comprising a plurality of frames, two consecutive frames being separated by an intermediate zone, said system comprises:
Dependencies are inferred from the claim text.