Apparatus and methods for gas phase particle reduction

A chamber lid, comprising:

• a top wall;
• a bottom wall;
• a plurality of vertical sidewalls;
• an interior volume within the chamber lid defined by the top wall, the bottom wall, and the plurality of vertical sidewalls;
• a plurality of air flow apertures, wherein:
• one or more air flow apertures of the plurality of air flow apertures is on a first vertical sidewall of the chamber lid,
• one or more air flow apertures of the plurality of air flow apertures is on a second vertical sidewall of the chamber lid,
• one or more air flow apertures is on the top wall of the chamber lid, and
• the plurality of air flow apertures are configured to fluidly communicate air moving inwardly from an exterior surface of the plurality of vertical sidewalls to the interior volume, and moving outwardly from the interior volume through the one or more air flow apertures on the top wall of the chamber lid;
• and
• a mesh disposed on a face of at least one of the air flow apertures of the plurality of air flow apertures.

A method of processing a substrate comprising:

• introducing the substrate into a processing volume of a substrate processing chamber, the substrate processing chamber comprising a chamber lid, the chamber lid comprising:
• a top wall;
• a bottom wall;
• a plurality of vertical sidewalls;
• an interior volume within the chamber lid defined by the top wall, the bottom wall, and the plurality of vertical sidewalls;
• a plurality of air flow apertures, wherein the plurality of air flow apertures is configured to fluidly communicate air into the interior volume and out of the interior volume;
• and
• a mesh disposed on a face of at least one of the air flow apertures of the plurality of air flow apertures;
• and
• performing one or more operations on the substrate.