Protective film with high hardness and low friction coefficient

Abstract

A protective film with high hardness and low friction coefficient includes an interface layer, a buffer layer, and a high-hardness passivation layer. The protective film has good wear resistance and low friction coefficient and can be applied to a mask package box for photolithography such as a deep ultraviolet (DUV) lithography, an extreme ultraviolet (EUV) lithography, an immersion lithography and a multiple patterning lithography of the photovoltaic and semiconductor industries. The protective film is used to protect the mask package box applied for photolithographic exposure and ensure the yield of the photolithographic process.

Dependencies are inferred from the claim text.