Back to results
US 2022/0045128 A1Published application
Memory material and memory device applying the same
AssigneeMacronix International Co., Ltd.
InventorsHuai-Yu CHENG, I-Ting KUO, Hsiang-Lan LUNG
Life of this patent
Estimating the term…
Abstract
A memory material and a memory device applying the same are provided. The memory material is a chalcogenide doped with carbon atom. The chalcogenide contains arsenic (As) atom, selenium (Se) atom, germanium (Ge) atom and silicon (Si) atom.
Claims20
A memory material, being a chalcogenide doped with carbon atom, wherein the chalcogenide contains arsenic (As) atom, selenium (Se) atom, germanium (Ge) atom and silicon (Si) atom.
A memory device, comprising:
- a first access line;
- a second access line;
- and
- a memory material electrically connected between the first access line and the second access line, wherein the memory material is a chalcogenide doped with carbon atom, the chalcogenide contains arsenic atom, selenium atom, germanium atom and silicon atom.
1 more element
Dependencies are inferred from the claim text.