Memory Arrays And Methods Used In Forming A Memory Array
AssigneeMicron Technology, Inc.
InventorsHarsh Narendrakumar Jain, Shuangqiang Luo
Life of this patent
Estimating the term…
Loading patent…
AssigneeMicron Technology, Inc.
InventorsHarsh Narendrakumar Jain, Shuangqiang Luo
Estimating the term…
A method used in forming a memory array comprising strings of memory cells comprises forming a stack comprising vertically-alternating first tiers and second tiers having channel-material strings therein. Conductive vias are formed through insulating material that is directly above the channel-material strings. Individual of the conductive vias are directly electrically coupled to individual of the channel-material strings. After forming the conductive vias, horizontally-elongated trenches are formed into the stack to form laterally-spaced memory-block regions. Intervening material is formed in the trenches laterally-between and longitudinally-along the immediately-laterally-adjacent memory-block regions. Additional methods and structures independent of method are disclosed.
1-16 (canceled)
A memory array comprising strings of memory cells, comprising:
A memory array comprising strings of memory cells, comprising:
Dependencies are inferred from the claim text.