Semiconductor device and method for manufacturing the same
AssigneeMitsubishi Electric Corporation
InventorsKoichiro NISHIZAWA, Takayuki HISAKA
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AssigneeMitsubishi Electric Corporation
InventorsKoichiro NISHIZAWA, Takayuki HISAKA
Estimating the term…
A device (2) is provided on an upper surface of the device substrate (1). A sealing frame (16) made of a non-electrolytic plating reactive catalyst metal is provided on the upper surface of the device substrate (1) and surrounds the device (2). An upper surface of the device substrate (1) and a lower surface of the cap substrate (10) are joined in a hollow state through the sealing frame (16). A plurality of electrodes (8,11,12) are connected to the device (2) and extended out of the device substrate (1) and the cap substrate (10). A metal film (20) is provided on an outer surface of the sealing frame (16) and not provided on the device substrate (1) and the cap substrate (10).
A semiconductor device comprising:
A method for manufacturing a semiconductor device comprising:
Dependencies are inferred from the claim text.