Substrate processing apparatus and substrate processing method

A substrate processing method using a substrate processing apparatus comprising a transfer block in which a transfer device configured to transfer a substrate is placed, and a processing block provided adjacent to the transfer block,

• wherein the processing block comprises a liquid film forming unit configured to form a liquid film on a top surface of the substrate which is held horizontally, and a drying unit configured to replace the liquid film with a supercritical fluid to dry the substrate,
• the drying unit comprises a pressure vessel having therein a drying chamber for the substrate, a cover body configured to close an opening of the drying chamber, and a supporting body configured to support the substrate horizontally in the drying chamber,
• the supporting body is fixed to the drying chamber, and
• wherein the substrate processing method comprises:
• forming the liquid film on the top surface of the substrate, which is held horizontally, by the liquid film forming unit;
• advancing the transfer device into the drying chamber through the opening of the drying chamber, while holding horizontally the substrate having the liquid film formed thereon by the transfer device;
• receiving, in the drying chamber, the substrate from the transfer device and holding the received substrate horizontally by the supporting body;
• retreating the transfer device to an outside of the drying chamber through the opening of the drying chamber;
• closing the opening of the drying chamber by the cover body;
• and
• replacing, in the drying chamber, the liquid film with the supercritical fluid to dry the substrate.