Gas analyzer apparatus
AssigneeAtonarp Inc.
InventorsNaoki TAKAHASHI, Prakash Sreedhar MURTHY
Life of this patent
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Abstract
There is provided a gas analyzer apparatus including: a sample chamber which is equipped with a dielectric wall structure and into which only sample gas to be measured is introduced; a plasma generation mechanism that generates plasma inside the sample chamber, which has been depressurized, using an electric field and/or a magnetic field applied through the dielectric wall structure; and an analyzer unit that analyzes the sample gas via the generated plasma. By doing so, it is possible to provide a gas analyzer apparatus capable of accurately analyzing sample gases, even those including corrosive gas, over a long period of time.
Claims16
A gas analyzer apparatus comprising:
- a sample chamber which is equipped with a dielectric wall structure and into which only a sample gas to be measured is introduced;
- a plasma generation mechanism that generates plasma in the sample chamber that has been depressurized, using an electric field and/or a magnetic field applied through the dielectric wall structure;
- and
- an analyzer unit that analyzes the sample gas via the generated plasma.
A control method of a system including a processing chamber that carries out a plasma process,
- wherein the system includes a gas analyzer apparatus including a sample chamber which differs to the processing chamber and into which only a sample gas from the processing chamber is introduced, and
- the control method comprises controlling the plasma process carried out in the processing chamber based on a measurement result of the gas analyzer apparatus.
A nontransitory computer readable medium encoded with a program product that controls a system including a processing chamber that carries out a plasma process,
- wherein the system further includes a gas analyzer apparatus including a sample chamber which differs to the processing chamber and into which only a sample gas from the processing chamber is introduced, and
- the program product comprises instructions that control the plasma process carried out in the processing chamber based on a measurement result provided by the gas analyzer apparatus.
Dependencies are inferred from the claim text.