Substrate processing apparatus
AssigneeASM IP Holding B.V.
InventorsWonKi Jeong, Yonjong Jeon, DongJun Park
Life of this patent
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Abstract
A substrate processing apparatus having a simplified exhaust structure includes: a substrate supporting unit configured to support a substrate; a first lid on the substrate supporting unit, the first lid including at least one processing unit; a second lid under the first lid, the second lid including a partition wall; and a support arranged under the first lid and the second lid and including an opening and a seating portion on the opening, wherein the second lid is on the seating portion of the support.
Claims21
A substrate processing apparatus comprising:
- a substrate supporting unit configured to support a substrate;
- a first lid on the substrate supporting unit, the first lid comprising at least one processing unit;
- a second lid under the first lid, the second lid comprising a partition wall;
- and
- a support arranged under the first lid and the second lid and comprising an opening and a seating portion on the opening,
- wherein the second lid is on the seating portion of the support.
A substrate processing apparatus comprising:
- a substrate supporting unit configured to support a substrate;
- a first lid on the substrate supporting unit, the first lid comprising at least one processing unit;
- and
- a second lid under the first lid,
- wherein a reaction space is formed between the substrate supporting unit and the processing unit,
- an exhaust space is formed to surround the reaction space, and
- a first side of the exhaust space is defined by the exhaust unit, and a second side of the exhaust space is defined by the support.
A substrate processing apparatus having an exhaust space,
- the substrate processing apparatus comprising:
- an exhaust unit defining at least a portion of the exhaust space;
- a support configured to support the exhaust unit and comprising a conductor;
- and
- a conductive extension arranged to surround a portion of the exhaust unit,
- wherein the conductive extension, together with the conductor of the support, is configured to prevent parasitic plasma generated in the exhaust space.
Dependencies are inferred from the claim text.