Material recovery systems for optical components

A material recovery system comprising:

• a reservoir configured to supply a gas flow containing a gas;
• an ion beam generator disposed on the reservoir and configured to receive the gas flow and to ionize the gas in the gas flow to generate an ion beam, the ion beam configured to be directed to an optical component to remove a degraded area of an optical material of the optical component due to exposure to VUV radiation, DUV radiation, and/or photo-contamination;
• an extractor disposed between the ion beam generator and the optical component and configured to extract ions from the ion beam generator upon a voltage is applied thereto;
• a multipole lens disposed between the extractor and the optical component and configured to focus, shape and raster the ion beam;
• and
• an aperture disposed between the multipole lens and the optical component.