Optoelectronic semiconductor component having a refractive index modulation layer and method for producing the optoelectronic semiconductor component

A method for producing an optoelectronic semiconductor component comprising:

• forming a first resonator mirror,
• forming an active region suitable for generating radiation,
• forming a second resonator mirror, wherein the first resonator mirror, the active region and the second resonator mirror are each arranged one above the other along a first direction, and
• forming a refractive index modulation layer within an optical resonator between the first resonator mirror and the second resonator mirror, the refractive index modulation layer comprising first regions of a first material having a first refractive index and second regions of a second material having a second refractive index, wherein the first regions are arranged directly adjacent to the second regions in in a plane perpendicular to the first direction, in which forming the refractive index modulation layer comprises:
• forming a first layer of the first material having the first refractive index,
• patterning the first material so that openings are formed in a first main surface of the first layer, wherein at least two of the openings extend to a different depth, and
• depositing a second layer of the second material having the second refractive index of refraction over the first layer, so that the openings in the first layer are filled with the second material.