Multi-showerhead chemical vapor deposition reactor, process and products

A multiple showerhead chemical vapor deposition reactor comprising:

• a reactor chamber enclosed by a chamber wall, the chamber having a length and a width, the length being greater than the width, the chamber wall having entry and exit seal ports at opposite ends of the chamber in the length direction for receiving and delivering a tape during deposition on said tape;
• a support plate within the chamber for supporting said tape, the support plate having a length and a width, the length being greater than the width;
• a precursor showerhead positioned within the chamber, the precursor showerhead having a length and a width, the length being greater than the width, the precursor showerhead positioned over the support plate with the length dimension of the precursor showerhead parallel to the length dimension of the support plate;
• first and second gas curtain shower heads positioned on either side of the precursor showerhead, the first and second gas curtain shower heads each having a length and a width, the length being longer than the width, the length dimensions of the gas curtain showerheads aligned parallel to the length dimension of the precursor showerhead;
• one or more first illumination sources positioned on a first side of the width of the chamber and one or more second illumination sources positioned on a second side of the width of the chamber so positioned and aligned to be capable to illuminate an upper surface of said tape during deposition by shining a beam of illumination under the respective gas curtain shower head and under the precursor showerhead to said upper surface.