Quantum dot display panel and manufacturing method thereof
AssigneeShenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
InventorLiangfen Zhang
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Abstract
The present invention provides a quantum dot display panel and a manufacturing method thereof. The present invention includes a pixel definition layer on a surface of a color film substrate, a quantum dot photoconversion film located on pixel definition regions of the pixel definition layer, and a blue light display device located under the quantum dot photoconversion film. An uplift layer and a light-shielding layer are arranged in the pixel definition layer to ensure that a thickness of the pixel definition layer is greater than or equal to 6 μm, which is beneficial to uniform curing of quantum dots in the quantum dot photoconversion film.
Claims20
A quantum dot display panel, comprising:
- a color film substrate comprising a base substrate and a color resistance layer located on a surface of the base substrate, wherein the color resistance layer is divided into a red, green, and blue (RGB) color resistance, and no black matrix is set between adjacent RGB color resistances;
- a pixel definition layer, wherein the pixel definition layer comprises an uplift layer and a light-shielding layer covering the uplift layer, and a lamination layer of the uplift layer and the light-shielding layer is located between the adjacent RGB color resistances and arranged opposite to the RGB color resistance to form pixel definition regions in an array;
- a quantum dot photoconversion film formed in the pixel definition regions;
- and
- an array substrate and a blue light display device located on the array substrate, wherein the color film substrate and the array substrate are arranged in pairs, and the blue light display device is arranged opposite to the quantum dot photoconversion film.
A quantum dot display panel, comprising:
- a color film substrate comprising a base substrate and a color resistance layer located on a surface of the base substrate, wherein the color resistance layer is divided into a red, green, and blue (RGB) color resistance, and no black matrix is set between adjacent RGB color resistances;
- a pixel definition layer disposed on a surface of the color film substrate and arranged opposite to the RGB color resistance to form pixel definition regions in an array;
- and
- a quantum dot photoconversion film formed in the pixel definition regions;
- wherein the pixel definition layer comprises an uplift layer and a light-shielding layer covering the uplift layer, and a lamination layer of the uplift layer and the light-shielding layer is located between the adjacent RGB color resistances.
A manufacturing method of a quantum dot display panel, comprising following steps:
- step 1:
- providing a base substrate, forming a color resistance layer on the base substrate, and completing a preparation of a color film substrate;
- step 2:
- forming a pixel definition layer on the color film substrate, defining the pixel definition layer as an interval to form pixel definition regions, ink droplet printing quantum dot particles into the pixel definition regions by inkjet printing technology, curing thereof by ultraviolet light, and completing a preparation of a quantum dot photoconversion film;
- and
- step 3:
- attaching the quantum dot photoconversion film on a corresponding blue light display device and a surface of an array substrate.
Dependencies are inferred from the claim text.