Photoelectric conversion apparatus, method of manufacturing the same, and image capturing system

An apparatus including a substrate including a pixel,

• wherein the pixel includes a first conversion portion and a second conversion portion in an in-plane direction of the substrate, the second conversion portion having a lower sensitivity to light than a sensitivity of the first conversion portion,
• wherein the apparatus includes an overflow transistor to discharge excessive charge of the first conversion portion,
• wherein, in a depth direction of the substrate, the apparatus includes a first member nearer a light incidence side of the first conversion portion and a second member nearer a light incidence side of the second conversion portion,
• wherein the first member is adjacent to the second member in the in-plane direction of the substrate, and
• wherein a refractive index of the first member is higher than a refractive index of the second member.

An apparatus including a substrate including a pixel,

• wherein the pixel includes a first conversion portion of a first conductivity type and a second conversion portion of the first conductivity type having a lower impurity concentration than an impurity concentration in the first conversion portion of the first conductivity type, the first conversion portion and the second conversion portion being in an in-plane direction of the substrate,
• wherein, in a depth direction of the substrate, a first member is nearer a light incidence side of the first conversion portion,
• wherein, in a depth direction of the substrate, a second member is nearer a light incidence side of the second conversion portion,
• wherein the first member is adjacent to the second member in the in-plane direction of the substrate, and
• wherein a refractive index of the first member is higher than a refractive index of the second member.

An apparatus including a substrate on which a pixel with a color filter is formed,

• wherein the pixel includes a first conversion portion and a second conversion portion in an in-plane direction of the substrate, the second conversion portion having a lower sensitivity to light than a sensitivity of the first conversion portion,
• wherein the first conversion portion and the second conversion portion are in a first plane parallel to a light incidence surface of the substrate,
• wherein a first member overlapping the first conversion portion and a second member overlapping the second conversion portion are adjacent to each other in a second plane parallel to the light incidence surface of the substrate,
• wherein the first member and the second member are under the color filter, and
• wherein a refractive index of the first member is higher than a refractive index of the second member.

A method comprising:

• forming a first semiconductor region and a second semiconductor region, the first semiconductor region constituting a conversion portion;
• and
• forming a first member between a light incidence surface side of the first semiconductor region and a part of a color filter and a second member between a light incidence surface side of the second semiconductor region and a part of the color filter,
• wherein the first member and the second member are adjacent to each other, and
• wherein a refractive index of the first member and a refractive index of the second member are different from each other.