Bump structure of the semiconductor package
AssigneePowertech Technology Inc.
InventorsChih-Yen SU, Chun-Te LIN
Life of this patent
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AssigneePowertech Technology Inc.
InventorsChih-Yen SU, Chun-Te LIN
Estimating the term…
The semiconductor package has a metal layer, a first dielectric layer formed on a metal layer, and an opening formed through the first dielectric layer to expose a part of the metal layer. The bump structure has an under bump metallurgy (hereinafter UBM), a first buffer layer and a metal bump. The UBM is formed on the first part of the metal layer, a sidewall of the opening and a top surface of the first dielectric layer. The first buffer layer is formed between a part of the UBM corresponding to the top surface of the first dielectric layer and the top surface of the first dielectric layer. The metal bump is formed on the UBM. Therefore, the first buffer layer effectively absorbs a thermal stress to avoid cracks generated in the bump structure after the bonding step.
A bump structure of a semiconductor package having a metal layer, a first dielectric layer formed on the metal layer and an opening formed through the first dielectric layer to expose a first part of the metal layer, wherein the first electric layer has a first length and the bump structure comprises:
Dependencies are inferred from the claim text.