Substrate processing method and substrate processing apparatus

A substrate processing method, comprising:

• lifting a substrate immersed in a rinsing liquid from the rinsing liquid and immersing the substrate in a rinsing liquid having a film of a first organic solvent having a surface tension smaller than that of the rinsing liquid on a liquid surface while the substrate passes through the film of the first organic solvent;
• lifting the substrate from the rinsing liquid while the substrate passes through the film of the first organic solvent;
• and
• supplying a vapor of a second organic solvent having a surface tension smaller than that of the rinsing liquid into a chamber in which the lifted substrate exists.

A substrate processing apparatus, comprising:

• a chamber;
• a tank which is disposed in the chamber;
• a substrate moving section which performs an operation in which a substrate immersed in a rinsing liquid is lifted from the rinsing liquid and the substrate is immersed in a rinsing liquid stored in the tank while a first organic solvent having a surface tension smaller than that of the rinsing liquid adheres to the substrate and an operation in which the substrate is lifted from the rinsing liquid;
• and
• a fluid supply section which supplies a vapor of a second organic solvent having a surface tension smaller than that of the rinsing liquid into the chamber in which the substrate lifted from the rinsing liquid by the substrate moving section exists.