Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectors

A wafer cleaning module, comprising:

• a wafer chuck to hold a wafer;
• a first quartz plate and a second quartz plate located above the wafer;
• a first ultraviolet (UV) lamp module comprising a first reflector located adjacent to the first quartz plate;
• a second UV lamp module comprising a second reflector located adjacent to the second quartz plate and opposite the first UV lamp module, wherein at least one of the first reflector or second reflector is rotatable;
• and
• an ozone source to provide ozone gas between the first quartz plate and the second quartz plate towards the wafer.

A method for cleaning a wafer in an wafer cleaning module having a first ultraviolet (UV) lamp module with a first rotatable reflector and a second UV lamp module with a second rotatable reflector, comprising:

• receiving, by a controller, information of a type of material located on a top surface of the wafer;
• rotating, by the controller, the first rotatable reflector and the second rotatable reflector into a position to control an amount of UV light directed towards the top surface of the wafer based on the information of the type of material;
• providing, by the controller, ozone gas towards the top surface of the wafer;
• and
• activating, by the controller, the first UV lamp module and the second UV lamp module to clean the top surface of the wafer.