Plasma processing apparatus and plasma processing method

A plasma processing method performed by a plasma processing apparatus including a processing chamber having a substrate support on which a substrate is placed, and a plurality of microwave radiation units arranged at a central portion and an outer peripheral portion of a ceiling wall of the processing chamber and configured to radiate microwaves, the method comprising:

• generating plasma from a processing gas supplied into the processing chamber using the microwaves radiated from the plurality of microwave radiation units and performing plasma processing on the substrate;
• and
• completing the microwave radiation from the microwave radiation unit in the central portion upon completion of the plasma processing of the substrate and, then, completing the microwave radiation from the microwave radiation units in the outer peripheral portion.

A plasma processing method performed by a plasma processing apparatus including a processing chamber having a substrate support on which a substrate is placed, and a plurality of microwave radiation units arranged at a ceiling wall of the processing chamber and configured to radiate microwaves, the method comprising:

• generating plasma from a processing gas supplied into the processing chamber using the microwaves radiated from the plurality of microwave radiation units and performing plasma processing on the substrate;
• and
• reducing the microwave radiation from at least one of the microwave radiation units in stages or continuously upon completion of the plasma processing of the substrate and, then, completing the microwave radiation from the plurality of microwave radiation units.