Shower plate, plasma processing apparatus and plasma processing method
AssigneesTokyo Electron Limited, Tohoku University
InventorsTaro IKEDA, Satoru KAWAKAMI, Masaki HIRAYAMA
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Abstract
In a shower plate, a plasma processing apparatus, and a plasma processing method, improvement of in-plane uniformity of plasma on a stage is required. The shower plate according to an exemplary embodiment includes an upper dielectric disposed to face a stage and an upper electrode embedded in the upper dielectric. A distance between a bottom surface of the upper dielectric and the upper electrode is shorter in a peripheral portion than in a central portion.
Claims15
1-7. (canceled)
A shower plate comprising:
- an upper dielectric disposed to face a stage;
- and
- an upper electrode embedded in the upper dielectric,
- wherein a distance between a bottom surface of the upper dielectric and the upper electrode is shorter in a peripheral portion of the shower plate than in a central portion of the shower plate.
A plasma processing apparatus comprising a shower plate that comprises an upper dielectric disposed to face a stage and an upper electrode embedded in the upper dielectric,
- wherein a distance between a bottom surface of the upper dielectric and the upper electrode is shorter in a peripheral portion of the shower plate than in a central portion of the shower plate,
- wherein the stage includes:
- a lower dielectric disposed to face the upper dielectric;
- and
- a lower electrode embedded in the lower dielectric, and
- wherein the plasma processing apparatus further includes:
- a processing container configured to accommodate the shower plate and the stage;
- and
- a radio frequency power supply configured to generate plasma in the processing container.
Dependencies are inferred from the claim text.