US 2022/0037115 A1 · INSULATOR FOR AN ION IMPLANTATION SOURCE

Abstract

An insulator for an ion implantation source may provide electrical insulation between high voltage components and relatively lower voltage components of the ion implantation source. To reduce the likelihood of and/or prevent a leakage path forming along the insulator, the insulator may include an internal cavity having a back and forth pattern. The back and forth pattern of the internal cavity increases the mean free path of gas molecules in the ion implantation source and increases the surface area of the insulator that is not directly or outwardly exposed to the gas molecules. This results in a continuous film or coating being more difficult and/or less likely to form along the insulator, which extends the working time of the ion implantation source.

Claims20

Dependent claims

An insulator for an ion implantation source, comprising:

a first portion, comprising:
a first plurality of guide walls,
a first plurality of channels formed by the first plurality of guide walls,
a core member;
and
a second portion, comprising:
a second plurality of guide walls, and
a second plurality of channels formed by the second plurality of guide walls,
wherein a combination of the first plurality of guide walls, the first plurality of channels, the second plurality of guide walls, and the second plurality of channels form a third channel to the core member when the core member is at least partially inserted into the second portion.

6 more elements

Dependencies are inferred from the claim text.

Facts

Application

16/947,430Filed 31 Jul 2020

Published

3 Feb 2022

Term ends

Not estimatedThe source records don’t support an estimate.

Classification7 codes

H01J 37/3171
For changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation: for ion implantation
H01J 37/32412
Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources: plasma immersion ion…
H01J 37/08
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical…:…
H01J 2237/0206
Protection arrangements: extinguishing, preventing or controlling unwanted discharges

Insulator for an ion implantation source

Life of this patent

Insulator for an ion implantation source

Life of this patent

Abstract

Claims20