Exposing apparatus and method for manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorsTakashi Hayakawa, Keiji Emoto
Life of this patent
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AssigneeCanon Kabushiki Kaisha
InventorsTakashi Hayakawa, Keiji Emoto
Estimating the term…
The exposing apparatus according to the present invention for exposing a substrate so as to transfer a pattern formed on an original to the substrate by using exposure light from a light source, includes a substrate stage on which the substrate is mounted, a driving unit configured to drive the substrate stage with a plurality of actuators each configured to apply a thrust to the substrate stage in respective orientations different from each other, and a controller configured to control the driving unit to cause the substrate stage to move in the scanning direction when exposing each of a plurality of shot regions on the substrate, and to cause each of the plurality of actuators to apply the thrust to the substrate stage in at least a part of time duration of each movement in the scanning direction.
An exposing apparatus for exposing a substrate so as to transfer a pattern formed on an original to the substrate by using exposure light from a light source, comprising:
A method for exposing a substrate so as to transfer a pattern formed on an original to the substrate by using exposure light from a light source in an exposing apparatus including a substrate stage on which the substrate is mounted, and a driving unit having a plurality of actuators each configured to apply a thrust to the substrate stage in respective orientations different from each other, comprising:
Dependencies are inferred from the claim text.