Extreme ultraviolet light generation system and electronic device manufacturing method

An electronic device manufacturing method, comprising:

• generating extreme ultraviolet light using an extreme ultraviolet light generation system;
• emitting the extreme ultraviolet light to an exposure apparatus;
• and
• exposing a photosensitive substrate to the extreme ultraviolet light in the exposure apparatus to manufacture an electronic device,
• the extreme ultraviolet light generation system including a laser system configured to emit first prepulse laser light, second prepulse laser light, and main pulse laser light in this order;
• a chamber including at least one window for introducing, into the chamber, the first prepulse laser light, the second prepulse laser light, and the main pulse laser light;
• a target supply unit configured to supply a target to a predetermined region in the chamber;
• and a processor configured to control the laser system so as to irradiate the target with the first prepulse laser light, irradiate the target, having been irradiated with the first prepulse laser light, with the second prepulse laser light having a pulse time width longer than a pulse time width of the main pulse laser light, and irradiate the target, having been irradiated with the second prepulse laser light, with the main pulse laser light temporally separated from the second prepulse laser light.