Substrate processing method, storage medium, and substrate processing apparatus

A substrate processing apparatus comprising:

• a rotating/holding part configured to hold and rotate a substrate;
• a liquid supply part including:
• a nozzle including an end surface facing a front surface of the substrate held by the rotating/holding part and a discharge port that is opened at the end surface and discharges a developer therethrough;
• and a driving part configured to move the nozzle along the front surface of the substrate;
• and
• a controller configured to control the rotating/holding part and the liquid supply part,
• wherein the controller sequentially executes:
• a first developing process of moving, by the driving part, the nozzle while making the end surface come into contact with the developer on the front surface of the substrate in a state in which the developer is discharged from the discharge port at a first flow rate while rotating the substrate by the rotating/holding part;
• and
• after the first developing process, a second developing process of discharging the developer from the discharge port at a second flow rate higher than the first flow rate in a state in which the end surface is in contact with the developer on the front surface of the substrate at a position facing a center of the front surface of the substrate while rotating the substrate by the rotating/holding part.