Original plate manufacturing method, drawing data creation method, and pattern defect repairing method

A pattern defect repairing method, comprising:

• preparing first design data and second design data from a predetermined pattern to be formed on a target object, the first design data corresponding to a first design pattern and the second design data corresponding to a second design pattern, the first and second design patterns being complementary portions of the predetermined pattern;
• drawing the first design pattern by irradiating a first photoresist film formed on a target object with a laser beam or a charged particle beam based on the first design data;
• forming the first design pattern on the target object using the first photoresist film in which the first design pattern has been drawn;
• performing an inspection on the target object on which the first design pattern has been formed;
• generating third design data based on a result of the inspection;
• adjusting the second design data based on the third design data to generate corrected second design data;
• and
• irradiating a second photoresist film with the laser beam or the charged particle beam based on the corrected second design data, the second photoresist film being formed on the target object on which the first design pattern has been formed.

A drawing data creation method, comprising:

• preparing first design data and second design data from a predetermined pattern, the first design data corresponding to a first design pattern and the second design data corresponding to a second design pattern, the first and second design patterns being complementary portions of the predetermined pattern;
• generating third design data based on an inspection of the formed first design pattern;
• and
• adjusting the second design data based on the third design data.