Method of forming shape on mask based on deep learning, and mask manufacturing method using the method of forming the shape on mask

A method of forming a mask, the method comprising:

• designing initial shapes on the mask corresponding to first patterns on a wafer;
• obtaining first images that have a bitmap format by performing rasterization and image correction on the initial shapes;
• obtaining signed distance images by applying a signed distance computation to the initial shapes on the mask corresponding to the first patterns on the wafer;
• performing deep learning with respect to a transformation relationship between ones of the first images and ones of the signed distance images corresponding to the first images;
• transforming an initial shape of the initial shapes on the mask corresponding to a target pattern on the wafer into a target first image by performing rasterization and image correction on the initial shape on the mask corresponding to the target pattern on the wafer;
• transforming the target first image into a target signed distance image, based on the deep learning;
• transforming the target signed distance image into a target shape on the mask;
• and
• manufacturing the mask comprising the target shape on the mask.

A mask manufacturing method comprising:

• obtaining first images by performing a first rasterization and a first image correction on shapes on a mask corresponding to first patterns on a wafer;
• obtaining second images by applying a transformation to the shapes on the mask;
• performing deep learning with respect to a transformation relationship between ones of the first images and ones of the second images corresponding to the first images;
• forming a target shape on the mask corresponding to a target pattern on the wafer, based on the deep learning;
• transmitting the target shape as Mask Tape-Out (MTO) design data;
• preparing for mask data, based on the MTO design data;
• and
• performing exposure on a mask substrate of the mask, based on the mask data.