Pattern shape evaluation device, pattern shape evaluation system, and pattern shape evaluation method

A pattern shape evaluation device configured to evaluate a shape of a line pattern formed on a sample, the pattern shape evaluation device comprising:

• a processor;
• a memory;
• and
• an edge extraction program and a pattern shape evaluation program which are read into the memory and executed by the processor, wherein
• the edge extraction program includes an edge position extraction unit configured to extract an edge position of the line pattern from a top-down image of the line pattern,
• the pattern shape evaluation program includes a noise floor calculation unit,
• a longitudinal direction of the line pattern in the top-down image is defined as a Y direction and a direction perpendicular to the longitudinal direction is defined as an X direction,
• the edge position extraction unit obtains an averaged signal profile obtained by performing a moving average of S pixels (S is an integer greater than 1) in the Y direction on a signal profile showing a secondary electron signal amount distribution in the X direction with respect to a predetermined Y coordinate obtained from the top-down image, and extracts the edge position of the line pattern based on the averaged signal profile, and
• the noise floor calculation unit calculates a noise floor height based on a first power spectral density of LER data or LWR data based on the edge position extracted by the edge position extraction unit and a second power spectral density of a rectangular window function corresponding to the moving average of the S pixels.