Device containing metal oxide-containing layers
AssigneeEvonik Operations GmbH
InventorsJürgen Steiger, Alexey Merkulov, Ralf Anselmann, Gerhard Renner
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AssigneeEvonik Operations GmbH
InventorsJürgen Steiger, Alexey Merkulov, Ralf Anselmann, Gerhard Renner
Estimating the term…
The present invention is directed to process for preparing a device comprising a first layer and a first electrode, the method comprising forming the first layer over a first electrode by applying a liquid anhydrous composition comprising at least one metal oxo alkoxide and at least one solvent, onto a surface, the surface being selected from the surface of the first electrode or the surface of a layer being located over the first electrode, optionally drying the composition, and converting the composition to a metal oxide-containing first layer, and forming a second electrode over the first device layer, wherein the method further includes forming a layer comprising quantum dots over the first electrode before or after the formation of the first layer and to the device itself.
A process for preparing a device comprising a first layer and a first electrode, the process comprising a step forming the first layer over a first electrode by applying a liquid anhydrous composition comprising
A device comprising a first layer formed over a first electrode, the first layer comprising a metal oxide formed from a liquid anhydrous composition containing at least one metal oxide precursor, a second electrode over the first layer, and a layer comprising quantum dots disposed between the first layer and one of the two electrodes.
Dependencies are inferred from the claim text.