Evaporation source, vapor deposition apparatus, and method for coating a substrate in a vacuum chamber

A method for coating a substrate in a vacuum chamber, comprising:

• evaporating a material in an evaporation crucible;
• guiding the evaporated material through a vapor conduit into a vapor distributor with a plurality of nozzles, the vapor conduit extending in a conduit length direction;
• directing the evaporated material with the plurality of nozzles toward the substrate, the plurality of nozzles having nozzle axes extending in, or essentially parallel to, the conduit length direction;
• and
• reducing heat radiation from the vapor distributor into the evaporation crucible and preventing splashes from the evaporation crucible into the vapor distributor with a baffle arrangement arranged in the vapor conduit.

A vapor deposition apparatus, comprising:

• a rotatable drum with a curved drum surface for supporting a substrate;
• and
• at least one evaporation source, comprising:
• an evaporation crucible for evaporating a material;
• a vapor distributor with a plurality of nozzles directed toward the curved drum surface, the plurality of nozzles arranged in a plurality of nozzle rows extending in a row direction and arranged next to each other;
• and
• a vapor conduit extending linearly in a conduit length direction from the evaporation crucible to the vapor distributor and providing a fluid connection between the evaporation crucible and the vapor distributor, wherein the nozzles have nozzle axes extending in or essentially parallel to the conduit length direction.