Method of fabricating thin film with varying thickness

A method of fabricating a thin film with a varying thickness, comprising the steps of:

• a) providing a shadow mask defining at least one radial line to a central point thereof, and having at least one opening, the opening defining a plurality of arcuate portions which extend respectively about the central point, and which are displaced from each other along the radial line;
• b) providing a carrier plate which defines a rotation axis extending in an axial direction through the central point, and which is spaced apart from the shadow mask in the axial direction;
• c) arranging on the carrier plate, at least one substrate which defines a first line to permit the first line to align with the radial line in the axial direction, the substrate having a plurality of first zones displaced from each other along the first line;
• d) after step c), rotating the carrier plate relative to the shadow mask about the rotation axis to permit the first zones of the substrate to be swept and exposed from the arcuate portions of the opening per each turn by a plurality of predetermined exposure times, respectively;
• and
• e) coating a material on the substrate through the opening of the shadow mask whilst implementing step d) to form on the substrate, a first thin film with a varying thickness along the first line corresponding to variation of the predetermined exposure times.