Mems sensor with particle filter and method for producing it

A method for producing a semiconductor device, wherein the method comprises:

• providing a microelectromechanical system chip having a first main surface and a second main surface situated opposite the first main surface, wherein the first main surface of the MEMS chip has a recess;
• providing a first glass-based substrate, wherein the first glass-based substrate has a plurality of perforation holes;
• applying the first main surface of the MEMS chip onto the first glass-based substrate in such a way that the recess becomes located over the plurality of perforation holes;
• providing a second substrate, which is arranged on the second main surface of the MEMS chip;
• and
• applying the second substrate to the second main surface of the MEMS chip.