US 2022/0028710 A1 · DISTRIBUTION COMPONENTS FOR SEMICONDUCTOR PROCESSING SYSTEMS

Abstract

Exemplary substrate processing systems may include a chamber body defining a transfer region. The systems may include a first lid plate seated on the chamber body along a first surface of the first lid plate. The first lid plate may define a plurality of apertures through the first lid plate. The systems may include a plurality of lid stacks equal to a number of apertures of the plurality of apertures defined through the first lid plate. The systems may include a plurality of isolators. An isolator of the plurality of isolators may be positioned between each lid stack of the plurality of lid stacks and a corresponding aperture of the plurality of apertures defined through the first lid plate. The systems may include a plurality of dielectric plates. A dielectric plate of the plurality of dielectric plates may be seated on each isolator of the plurality of isolators.

Claims20

Dependent claims

A substrate processing system comprising:

a chamber body defining a transfer region;
a first lid plate seated on the chamber body along a first surface of the first lid plate, wherein the first lid plate defines a plurality of apertures through the first lid plate;
a plurality of lid stacks equal to a number of apertures of the plurality of apertures defined through the first lid plate, wherein the plurality of lid stacks at least partially define a plurality of processing regions vertically offset from the transfer region;
a plurality of isolators, wherein an isolator of the plurality of isolators is positioned between each lid stack of the plurality of lid stacks and a corresponding aperture of the plurality of apertures defined through the first lid plate;
and
a plurality of dielectric plates, wherein a dielectric plate of the plurality of dielectric plates is seated on each isolator of the plurality of isolators.

3 more elements

A substrate processing chamber faceplate comprising:

a first plate defining a first set of channels in a first surface of the first plate, wherein the first set of channels extend from a first location to a plurality of second locations, and wherein a first aperture extending through the first plate is defined at each second location of the plurality of second locations;
a second plate coupled with the first plate, wherein the second plate defines a plurality of first apertures extending through the second plate, and wherein the second plate defines a greater number of apertures than the first plate;
a third plate coupled with the second plate, wherein the third plate comprises a plurality of tubular extensions extending from a first surface of the third plate towards the second plate, wherein the third plate includes an identical number of tubular extensions as first apertures of the second plate, and wherein each tubular extension of the third plate is axially aligned with a corresponding first aperture through the second plate;
and
a fourth plate coupled with the third plate, wherein the fourth plate defines a plurality of first apertures extending through the fourth plate, and wherein the fourth plate defines a greater number of apertures than the second plate.

2 more elements

Dependencies are inferred from the claim text.

Distribution components for semiconductor processing systems

Life of this patent

Distribution components for semiconductor processing systems

Life of this patent

Abstract

Claims20