Processing apparatus and plasma processing method
AssigneesTokyo Electron Limited, Tohoku University
InventorMasaki HIRAYAMA
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AssigneesTokyo Electron Limited, Tohoku University
InventorMasaki HIRAYAMA
Estimating the term…
A plasma processing apparatus according to an exemplary embodiment includes a processing container, a stage, a dielectric plate, an upper electrode, an introduction part, a driving shaft, and an actuator. The stage is provided in the processing container. The dielectric plate is provided above the stage via a space in the processing container. The upper electrode has flexibility, is provided above the dielectric plate, and provides a gap between the dielectric plate and the upper electrode. The introduction part is an introduction part of radio frequency waves that are VHF waves or UHF waves, is provided at a horizontal end portion of the space. The driving shaft is coupled to the upper electrode on a central axial line of the processing container. The actuator is configured to move the driving shaft in a vertical direction.
1-13. (canceled)
A plasma processing apparatus comprising:
A plasma processing method of performing plasma processing on a substrate by using a plasma processing apparatus, the method comprising:
Dependencies are inferred from the claim text.