Plasma-enhanced chemical vapor deposition apparatus and method of forming lithium-based film by using the same

A method of forming a lithium (Li)-based film, the method comprising:

• supplying a Li source material into a reaction chamber in which a substrate is disposed;
• supplying phosphor (P) and oxygen (O) source materials and a nitrogen (N) source material into the reaction chamber;
• and
• generating plasma in the reaction chamber to form a Li-based film on the substrate from the Li, P, O, and N source materials,
• wherein the supplying of the Li source material into the reaction chamber and the supplying of the P and O source materials and the N source material into the reaction chamber are performed with a time interval,
• wherein the Li source material supplied into the reaction chamber is deposited on the substrate, and the P and O source materials supplied into the reaction chamber are adsorbed on the Li source material.